“Optimising the Resist and Dedication Allocation for Capacity Maximisation in a Wafer Fabrication Plant” – D-SIMLAB’s novel, heuristic-based optimisation approach to automate the process of optimising layer to tool dedication and corresponding resist installations in the lithography area of a semiconductor wafer fab will be presented at the 20th European Advanced Process Control and Manufacturing Process (apc|m) Conference, to be held during 4-6 April 2022 in Toulon, France.
2022
The optimisation approach achieves a trade-off between the risk of capacity loss and/or excessive cycle time increase caused by tool downs (in case too few